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A false alarm or a backwater fight? Intel 7Nm EUV is progressing smoothly

via:3DMGame     time:2018/12/7 20:09:36     readed:501

In fact, Intel has been skipping the ticket because of "radical pursuit of technological objectives in the basic setting stage", because Intel's 10-nm process still relies on a 193-nm wavelength UV (deep ultraviolet) lithographic machine, resulting in great challenges in reaching the set transistor density, but they are still hard-headed and refuse to drain water, making progress. Dragging on.

But this experience will give Intel a wealth of experience, as Murthy Renduchintala, Chief Engineering Officer and President of Technology, System Architecture and Client Products, revealed at the 39th NASDAQ Investment Conference.7Nm is an independent system and team. He is very satisfied with the current progress. After fully absorbing the lessons of 10nm, he evolves in accordance with the internal plan.

AndIntel's 7Nm EUV-based lithography technology will re-implement Moore's law at the micro-scale level。 But they always keep a strict voice on the 7Nm news. AT guesses that it should be launched in the fourth year after 10nm. So by the end of 2020, if it can be done, the 10nm process will be the shortest generation process.

AT estimates that Intel may also have 20 to 40 additional ASML 7Nm EUV lithographs to achieve 100,000 tablets per month. (Seven-nanometer EUV lithography machine sells for 120 million US dollars.)

Intel's 10nm has been skipping tickets, but they have gained tremendous experience in R&D. From my personal point of view, Intel is to challenge all the process of R&D without bowing to TSMC. Slow or slow, but it can have more technical experience. As long as a few more new lithographic machines are deployed, it can improve the capacity of mass production. That's why the ticket jump took so long, so it's normal to squeeze toothpaste. Maybe Intel will be able to grasp the direction of the market and stay in the top position with more experience.

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